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Plasma diagnostics and processings in CF4/He radio frequency discharge.

Authors :
Mutsukura, N.
Shimada, M.
Source :
Journal of Vacuum Science & Technology: Part A-Vacuums, Surfaces & Films; 1997, Vol. 15 Issue 4, p1828-1831, 4p
Publication Year :
1997

Details

Language :
English
ISSN :
07342101
Volume :
15
Issue :
4
Database :
Complementary Index
Journal :
Journal of Vacuum Science & Technology: Part A-Vacuums, Surfaces & Films
Publication Type :
Academic Journal
Accession number :
74334459
Full Text :
https://doi.org/10.1116/1.580799