Measurements of the Cl atom concentration in radio-frequency and microwave plasmas by two-photon laser-induced fluorescence: Relation to the etching of Si.

Details

Language :

English

ISSN :

07342101

Volume :

10

Issue :

4

Database :

Complementary Index

Journal :

Journal of Vacuum Science & Technology: Part A-Vacuums, Surfaces & Films

Publication Type :

Academic Journal

Accession number :

74331723

Full Text :

https://doi.org/10.1116/1.578204