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A simplified silylation process.
- Source :
- Journal of Vacuum Science & Technology: Part B-Microelectronics Processing & Phenomena; 1989, Vol. 7 Issue 6, p1709-1716, 8p
- Publication Year :
- 1989
Details
- Language :
- English
- ISSN :
- 0734211X
- Volume :
- 7
- Issue :
- 6
- Database :
- Complementary Index
- Journal :
- Journal of Vacuum Science & Technology: Part B-Microelectronics Processing & Phenomena
- Publication Type :
- Academic Journal
- Accession number :
- 74326136
- Full Text :
- https://doi.org/10.1116/1.584444