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Exposing submicron patterns with a variable shaped electron beam machine.

Authors :
Gu, W. Q.
He, M. H.
Han, R. T.
Source :
Journal of Vacuum Science & Technology: Part B-Microelectronics Processing & Phenomena; 1987, Vol. 5 Issue 1, p110-113, 4p
Publication Year :
1987

Details

Language :
English
ISSN :
0734211X
Volume :
5
Issue :
1
Database :
Complementary Index
Journal :
Journal of Vacuum Science & Technology: Part B-Microelectronics Processing & Phenomena
Publication Type :
Academic Journal
Accession number :
74325164
Full Text :
https://doi.org/10.1116/1.583607