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SiO2/InP interfaces with reduced interface state density.

Authors :
Wager, J. F.
Clark, M. D.
Jullens, R. A.
Source :
Journal of Vacuum Science & Technology: Part B-Microelectronics Processing & Phenomena; 1984, Vol. 2 Issue 3, p584-587, 4p
Publication Year :
1984

Details

Language :
English
ISSN :
0734211X
Volume :
2
Issue :
3
Database :
Complementary Index
Journal :
Journal of Vacuum Science & Technology: Part B-Microelectronics Processing & Phenomena
Publication Type :
Academic Journal
Accession number :
74324336
Full Text :
https://doi.org/10.1116/1.582843