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Influence of electric field intensity on the copper catalyst-mediated crystallization of amorphous silicon.
- Source :
- Journal of Vacuum Science & Technology: Part B-Microelectronics & Nanometer Structures; 2005, Vol. 23 Issue 2, p525-529, 5p
- Publication Year :
- 2005
Details
- Language :
- English
- ISSN :
- 10711023
- Volume :
- 23
- Issue :
- 2
- Database :
- Complementary Index
- Journal :
- Journal of Vacuum Science & Technology: Part B-Microelectronics & Nanometer Structures
- Publication Type :
- Academic Journal
- Accession number :
- 74323067
- Full Text :
- https://doi.org/10.1116/1.1880272