Negative resist image by dry etching as a surface imaging process using focused ion beams.

Details

Language :

English

ISSN :

10711023

Volume :

22

Issue :

1

Database :

Complementary Index

Journal :

Journal of Vacuum Science & Technology: Part B-Microelectronics & Nanometer Structures

Publication Type :

Academic Journal

Accession number :

74322334

Full Text :

https://doi.org/10.1116/1.1641058