Hydroxyl Radical Etching Improves Adhesion of Plasma-Deposited a-SiO xC yH z Films on Poly(Methylmethacrylate).

Details

Language :

English

ISSN :

16128850

Volume :

9

Issue :

4

Database :

Complementary Index

Journal :

Plasma Processes & Polymers

Publication Type :

Academic Journal

Accession number :

74194538

Full Text :

https://doi.org/10.1002/ppap.201100159