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In-situ void formation technique using an AlN shell structure grown on GaN stripes on Si(111) and c-plane sapphire substrates.

Authors :
Mitsunari, Tadashi
Tanikawa, Tomoyuki
Honda, Yoshio
Yamaguchi, Masahito
Amano, Hiroshi
Source :
Physica Status Solidi (C); Mar2012, Vol. 9 Issue 3/4, p480-483, 4p
Publication Year :
2012

Details

Language :
English
ISSN :
18626351
Volume :
9
Issue :
3/4
Database :
Complementary Index
Journal :
Physica Status Solidi (C)
Publication Type :
Academic Journal
Accession number :
73760567
Full Text :
https://doi.org/10.1002/pssc.201100502