Back to Search Start Over

Process-Introduced Structural Defects and Junction Characteristics in N P N Silicon Epitaxial Planar Transistors.

Authors :
Jungbluth, E. D.
Wang, P.
Source :
Journal of Applied Physics; Jun1965, Vol. 36 Issue 6, p1967-1973, 7p
Publication Year :
1965

Details

Language :
English
ISSN :
00218979
Volume :
36
Issue :
6
Database :
Complementary Index
Journal :
Journal of Applied Physics
Publication Type :
Academic Journal
Accession number :
73378545
Full Text :
https://doi.org/10.1063/1.1714384