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Substrate and doping effects upon laser-induced epitaxy of amorphous silicon.

Authors :
Bean, J. C.
Leamy, H. J.
Poate, J. M.
Rozgonyi, G. A.
van der Ziel, J. P.
Williams, J. S.
Celler, G. K.
Source :
Journal of Applied Physics; Feb1979, Vol. 50 Issue 2, p881-885, 5p
Publication Year :
1979

Details

Language :
English
ISSN :
00218979
Volume :
50
Issue :
2
Database :
Complementary Index
Journal :
Journal of Applied Physics
Publication Type :
Academic Journal
Accession number :
73371740
Full Text :
https://doi.org/10.1063/1.326004