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The mechanism of the enhancement of divacancy production by oxygen during electron irradiation of silicon. II. Computer modeling.

Authors :
Oehrlein, G. S.
Krafcsik, I.
Lindström, J. L.
Jaworowski, A. E.
Corbett, J. W.
Source :
Journal of Applied Physics; Jan1983, Vol. 54 Issue 1, p179-183, 5p
Publication Year :
1983

Details

Language :
English
ISSN :
00218979
Volume :
54
Issue :
1
Database :
Complementary Index
Journal :
Journal of Applied Physics
Publication Type :
Academic Journal
Accession number :
72870377
Full Text :
https://doi.org/10.1063/1.331728