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The mechanism of the enhancement of divacancy production by oxygen during electron irradiation of silicon. II. Computer modeling.
- Source :
- Journal of Applied Physics; Jan1983, Vol. 54 Issue 1, p179-183, 5p
- Publication Year :
- 1983
Details
- Language :
- English
- ISSN :
- 00218979
- Volume :
- 54
- Issue :
- 1
- Database :
- Complementary Index
- Journal :
- Journal of Applied Physics
- Publication Type :
- Academic Journal
- Accession number :
- 72870377
- Full Text :
- https://doi.org/10.1063/1.331728