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Electrical activation process of phosphorus atoms with annealing for doped CVD poly-Si.

Authors :
Hasegawa, S.
Kasajima, T.
Shimizu, T.
Source :
Journal of Applied Physics; Nov1979, Vol. 50 Issue 11, p7256-7257, 2p
Publication Year :
1979

Details

Language :
English
ISSN :
00218979
Volume :
50
Issue :
11
Database :
Complementary Index
Journal :
Journal of Applied Physics
Publication Type :
Academic Journal
Accession number :
72866602
Full Text :
https://doi.org/10.1063/1.325805