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Time evolution of developed contours in poly-(methyl methacrylate) electron resist.

Authors :
Greeneich, James S.
Source :
Journal of Applied Physics; Dec1974, Vol. 45 Issue 12, p5264-5268, 5p
Publication Year :
1974

Details

Language :
English
ISSN :
00218979
Volume :
45
Issue :
12
Database :
Complementary Index
Journal :
Journal of Applied Physics
Publication Type :
Academic Journal
Accession number :
72862026
Full Text :
https://doi.org/10.1063/1.1663227