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Comparison of interface-state buildup in MOS capacitors subjected to penetrating and nonpenetrating radiation.

Authors :
Winokur, Peter S.
Sokoloski, Martin M.
Source :
Applied Physics Letters; May1976, Vol. 28 Issue 10, p627-630, 4p
Publication Year :
1976

Details

Language :
English
ISSN :
00036951
Volume :
28
Issue :
10
Database :
Complementary Index
Journal :
Applied Physics Letters
Publication Type :
Academic Journal
Accession number :
71736676
Full Text :
https://doi.org/10.1063/1.88592