Back to Search
Start Over
Modeling and Simulation of a Chemical Vapor Deposition.
- Source :
- Journal of Applied Mathematics; 2011, Special section p1-25, 25p
- Publication Year :
- 2011
-
Abstract
- We are motivated to model PE-CVD (plasma enhanced chemical vapor deposition) processes for metallic bipolar plates, and their optimization for depositing a heterogeneous layer on the metallic plate. Moreover a constraint to the deposition process is a very low pressure (nearly a vacuum) and a low temperature (about 400K). The contribution of this paper is to derive a multiphysics system of multiple physics problems that includes some assumptions to simplify the complicate process and allows of deriving a computable mathematical model without neglecting the real-life processes. To model the gaseous transport in the apparatus we employ mobile gas phase streams, immobile and mobile phases in a chamber that is filled with porous medium (plasma layers). Numerical methods are discussed to solve such multi-scale and multi phase models and to obtain qualitative results for the delicate multiphysical processes in the chamber. We discuss a splitting analysis to couple such multiphysical problems. The verification of such a complicated model is done with real-life experiments for single species. Such numerical simulations help to economize on expensive physical experiments and obtain control mechanisms for the delicate deposition process. [ABSTRACT FROM AUTHOR]
Details
- Language :
- English
- ISSN :
- 1110757X
- Database :
- Complementary Index
- Journal :
- Journal of Applied Mathematics
- Publication Type :
- Academic Journal
- Accession number :
- 71726843
- Full Text :
- https://doi.org/10.1155/2011/641920