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Application of low temperature GaAs to GaAs/Si.

Authors :
Fujioka, Hiroshi
Sohn, Hyunchul
Weber, Eicke
Verma, Ashish
Source :
Journal of Electronic Materials; Dec1993, Vol. 22 Issue 12, p1511-1514, 4p
Publication Year :
1993

Abstract

Low Temperature grown GaAs (LT-GaAs) was incorporated as a buffer layer for GaAs on Si (GaAs/Si) and striking advantages of this structure were confirmed. The LT-GaAs layer showed high resistivity of 1.7 × 10 ω-cm even on a highly defective GaAs/Si. GaAs/Si with the LT-GaAs buffer layers had smoother surfaces and showed much higher photoluminescence intensities than those without LT-GaAs. Schottky diodes fabricated on GaAs/Si with LT-GaAs showed a drastically reduced leakage current and an improved ideality factor. These results indicate that the LT-GaAs buffer layer is promising for future integrated circuits which utilize GaAs/Si substrates. [ABSTRACT FROM AUTHOR]

Details

Language :
English
ISSN :
03615235
Volume :
22
Issue :
12
Database :
Complementary Index
Journal :
Journal of Electronic Materials
Publication Type :
Academic Journal
Accession number :
71642603
Full Text :
https://doi.org/10.1007/BF02650010