The inverted horizontal reactor: Growth of uniform InP and GaInAs by LPMOCVD.

MLA

Puetz, N., et al. “The Inverted Horizontal Reactor: Growth of Uniform InP and GaInAs by LPMOCVD.” Journal of Electronic Materials, vol. 17, no. 5, Sept. 1988, pp. 381–86. EBSCOhost, https://doi.org/10.1007/BF02652122.

APA

Puetz, N., Hillier, G., & Springthorpe, A. (1988). The inverted horizontal reactor: Growth of uniform InP and GaInAs by LPMOCVD. Journal of Electronic Materials, 17(5), 381–386. https://doi.org/10.1007/BF02652122

Chicago

Puetz, N., G. Hillier, and A. Springthorpe. 1988. “The Inverted Horizontal Reactor: Growth of Uniform InP and GaInAs by LPMOCVD.” Journal of Electronic Materials 17 (5): 381–86. doi:10.1007/BF02652122.