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Improvement of EUVL mask blank inspection capability at Intel.

Authors :
Ma, Andy
Liang, Ted
Park, Seh-Jin
Zhang, Guojing
Tamura, Tomoya
Omata, Kazunori
Sato, Yuta
Kusunose, Hal
Source :
Proceedings of SPIE; Nov2009 Part 3, Issue 1, p73790I-73790I-11, 11p
Publication Year :
2009

Details

Language :
English
ISSN :
0277786X
Issue :
1
Database :
Complementary Index
Journal :
Proceedings of SPIE
Publication Type :
Conference
Accession number :
67390983
Full Text :
https://doi.org/10.1117/12.824259