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Interface characterization and thermal stability of Co/Al–O/CoFe spin-dependent tunnel junctions.
- Source :
- Journal of Applied Physics; 5/15/2002 Part 1, 2 & 3, Vol. 91 Issue 10, p7475, 3p, 1 Black and White Photograph, 3 Graphs
- Publication Year :
- 2002
-
Abstract
- A detailed study of the interface properties as well as the thermal stability has been done for the Co/Al-O/CoFe/NiFe magnetic tunnel junction, by using high resolution transmission electron microscopy equipped with energy dispersive x-ray spectrum. The Al behaves more stable against thermal annealing compared with the Fe, Co, Ni, and O elements. The reduction of the tunnel magnetoresistance ratio for the low annealing temperature (200 °C) may be caused by the spin flip scattering at oxide ion, rather than by the change in magnetic properties. The annealing at higher temperatures (300 °C and 400 °C) results in a strong interdiffusion, and in turn the disappearance of the magnetoresistance due to the shortcut of the junction. [ABSTRACT FROM AUTHOR]
- Subjects :
- INTERFACES (Physical sciences)
TRANSMISSION electron microscopy
Subjects
Details
- Language :
- English
- ISSN :
- 00218979
- Volume :
- 91
- Issue :
- 10
- Database :
- Complementary Index
- Journal :
- Journal of Applied Physics
- Publication Type :
- Academic Journal
- Accession number :
- 6666970
- Full Text :
- https://doi.org/10.1063/1.1452228