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A single-exposure approach for patterning 45nm flash/DRAM contact hole mask.
- Source :
- Proceedings of SPIE; Nov2006 Part 2, Issue 1, p62831A-62831A-12, 12p
- Publication Year :
- 2006
Details
- Language :
- English
- ISSN :
- 0277786X
- Issue :
- 1
- Database :
- Complementary Index
- Journal :
- Proceedings of SPIE
- Publication Type :
- Conference
- Accession number :
- 65728988
- Full Text :
- https://doi.org/10.1117/12.681873