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Advanced CD AFM metrology for 3D critical shape and dimension control of photomask etch processing.
- Source :
- Proceedings of SPIE; Nov2006 Part 2, Issue 1, p63493Z-63493Z-10, 10p
- Publication Year :
- 2006
Details
- Language :
- English
- ISSN :
- 0277786X
- Issue :
- 1
- Database :
- Complementary Index
- Journal :
- Proceedings of SPIE
- Publication Type :
- Conference
- Accession number :
- 65726285
- Full Text :
- https://doi.org/10.1117/12.684767