An integrated self-masking technique for providing low-loss metallized RF MEMS devices in a polysilicon only MEMS process (Invited Paper).

Details

Language :

English

ISSN :

0277786X

Issue :

1

Database :

Complementary Index

Journal :

Proceedings of SPIE

Publication Type :

Conference

Accession number :

65709729

Full Text :

https://doi.org/10.1117/12.607592