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Acid mobility in chemically amplified photoresists.

Authors :
Stewart, Michael D.
Becker, Darren J.
Stachowiak, Timothy B.
Schmid, Gerard M.
Michaelson, Timothy B.
Tran, Hoang V.
Willson, C. Grant
Source :
Proceedings of SPIE; Nov2002, Issue 1, p943-951, 9p
Publication Year :
2002

Details

Language :
English
ISSN :
0277786X
Issue :
1
Database :
Complementary Index
Journal :
Proceedings of SPIE
Publication Type :
Conference
Accession number :
65673512
Full Text :
https://doi.org/10.1117/12.474168