Back to Search Start Over

Microfluidic simulations for immersion lithography.

Authors :
Wei, Alexander C.
Nellis, Gregory F.
Abdo, Amr Y.
Engelstad, Roxann L.
Chen, Cheng-fu
Switkes, Michael
Rothschild, Mordechai
Source :
Journal of Micro/Nanolithography, MEMS & MOEMS; Jan2004, Vol. 3 Issue 1, p28-34, 7p
Publication Year :
2004

Details

Language :
English
ISSN :
19325150
Volume :
3
Issue :
1
Database :
Complementary Index
Journal :
Journal of Micro/Nanolithography, MEMS & MOEMS
Publication Type :
Academic Journal
Accession number :
65460466
Full Text :
https://doi.org/10.1117/1.1632500