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Crystalline, Uniform-Sized TiO2 Nanosphere Films by a Novel Plasma CVD Process at Atmospheric Pressure and Room Temperature.

Authors :
Zhu, A.-M.
Nie, L.-H.
Wu, Q.-H.
Zhang, X.-L.
Yang, X.-F.
Xu, Y.
Shi, C.
Source :
Chemical Vapor Deposition; Apr2007, Vol. 13 Issue 4, p141-144, 4p
Publication Year :
2007

Details

Language :
English
ISSN :
09481907
Volume :
13
Issue :
4
Database :
Complementary Index
Journal :
Chemical Vapor Deposition
Publication Type :
Academic Journal
Accession number :
64970574
Full Text :
https://doi.org/10.1002/cvde.200604230