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Crystalline, Uniform-Sized TiO2 Nanosphere Films by a Novel Plasma CVD Process at Atmospheric Pressure and Room Temperature.
- Source :
- Chemical Vapor Deposition; Apr2007, Vol. 13 Issue 4, p141-144, 4p
- Publication Year :
- 2007
Details
- Language :
- English
- ISSN :
- 09481907
- Volume :
- 13
- Issue :
- 4
- Database :
- Complementary Index
- Journal :
- Chemical Vapor Deposition
- Publication Type :
- Academic Journal
- Accession number :
- 64970574
- Full Text :
- https://doi.org/10.1002/cvde.200604230