Back to Search
Start Over
CVD of GaN Films on Si(111). Chemically Clean Decomposition of Et2Ga(N3)·MeHNNH2.
- Source :
- Chemical Vapor Deposition; Mar2002, Vol. 8 Issue 2, p50-52, 3p
- Publication Year :
- 2002
Details
- Language :
- English
- ISSN :
- 09481907
- Volume :
- 8
- Issue :
- 2
- Database :
- Complementary Index
- Journal :
- Chemical Vapor Deposition
- Publication Type :
- Academic Journal
- Accession number :
- 64970399
- Full Text :
- https://doi.org/10.1002/1521-3862(20020304)8:2<50::AID-CVDE50>3.0.CO;2-2