Combined Continuous Wave and Pulsed Plasma Modes: For More Stable Interfaces with Higher Functionality on Metal and Semiconductor Surfaces.

Details

Language :

English

ISSN :

16128850

Volume :

6

Issue :

10

Database :

Complementary Index

Journal :

Plasma Processes & Polymers

Publication Type :

Academic Journal

Accession number :

64945546

Full Text :

https://doi.org/10.1002/ppap.200900042