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Titanium implantation in bulk and thin film amorphous silica.
- Source :
- Journal of Applied Physics; 5/15/1998, Vol. 83 Issue 10, p5150, 4p, 4 Black and White Photographs, 1 Diagram, 1 Chart, 4 Graphs
- Publication Year :
- 1998
-
Abstract
- Provides information on a study investigating bulk and thin film amorphous silica implanted with titanium. Methodology used to conduct study; Measurements of titanium profiles with energy dispersive spectrometry (EDS) and secondary ion mass spectroscopy (SIMS); Indepth look at the measurements of optical properties; Results of study.
- Subjects :
- TITANIUM
Subjects
Details
- Language :
- English
- ISSN :
- 00218979
- Volume :
- 83
- Issue :
- 10
- Database :
- Complementary Index
- Journal :
- Journal of Applied Physics
- Publication Type :
- Academic Journal
- Accession number :
- 648982
- Full Text :
- https://doi.org/10.1063/1.367332