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ChemInform Abstract: Low Pressure Chemical Vapor Deposition of Si1-xGex Films Using Si2H6 and GeH4 Source Gases.
- Source :
- ChemInform; May1996, Vol. 27 Issue 19, pno-no, 1p
- Publication Year :
- 1996
Details
- Language :
- English
- ISSN :
- 09317597
- Volume :
- 27
- Issue :
- 19
- Database :
- Complementary Index
- Journal :
- ChemInform
- Publication Type :
- Academic Journal
- Accession number :
- 64597838
- Full Text :
- https://doi.org/10.1002/chin.199619280