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A Single-Temperature Trimming Technique for MOS-Input Operational Amplifiers Achieving 0.33 \muV/^\circC Offset Drift.

Authors :
Bolatkale, Muhammed
Pertijs, Michiel A. P.
Kindt, Wilko J.
Huijsing, Johan H.
Makinwa, Kofi A. A.
Source :
IEEE Journal of Solid-State Circuits; Aug2011, Vol. 46 Issue 9, p2099-2107, 9p
Publication Year :
2011

Abstract

A MOS-input operational amplifier has a reconfigurable input stage that enables trimming of both offset and offset drift based only on single-temperature measurements. The input stage consists of a MOS differential pair, whose offset drift is predicted from offset voltage measurements made at well-defined bias currents. A theoretical motivation for this approach is presented and validated experimentally by characterizing the offset of pairs of discrete MOS transistors as a function of bias current and temperature. An opamp using the proposed single-temperature trimming technique has been designed and fabricated in a 0.5 \mum BiCMOS process. After single-temperature trimming, it achieves a maximum offset of \pm 30\ \muV and an offset drift of 0.33 \mu V/^\circC (3\sigma) over the temperature range of -40^\circC to +125^\circC. [ABSTRACT FROM PUBLISHER]

Details

Language :
English
ISSN :
00189200
Volume :
46
Issue :
9
Database :
Complementary Index
Journal :
IEEE Journal of Solid-State Circuits
Publication Type :
Academic Journal
Accession number :
64470021
Full Text :
https://doi.org/10.1109/JSSC.2011.2139530