Acceleration effect of electroless nickel deposition by thiourea.

Authors :: Ke-Ping, Han
Jing-Li, Fang
Source :: International Journal of Chemical Kinetics; Apr1996, Vol. 28 Issue 4, p259-264, 6p
Publication Year :: 1996

Language :: English
ISSN :: 05388066
Volume :: 28
Issue :: 4
Database :: Complementary Index
Journal :: International Journal of Chemical Kinetics
Publication Type :: Academic Journal
Accession number :: 62177028
Full Text :: https://doi.org/10.1002/(SICI)1097-4601(1996)28:4<259::AID-KIN3>3.0.CO;2-U