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Single-Event Transient Measurements in nMOS and pMOS Transistors in a 65-nm Bulk CMOS Technology at Elevated Temperatures.

Authors :
Gadlage, Matthew J.
Ahlbin, Jonathan R.
Narasimham, Balaji
Bhuva, Bharat L.
Massengill, Lloyd W.
Schrimpf, Ronald D.
Source :
IEEE Transactions on Device & Materials Reliability; 03/01/2011, Vol. 11 Issue 1, p179-186, 8p
Publication Year :
2011

Abstract

In this paper, heavy-ion-induced single-event transient (SET) pulsewidths measured in a 65-nm bulk CMOS technology at temperatures ranging from 25 ^\circ\C to 100 ^\circ\C with an autonomous SET capture circuit are presented. The experimental results for the SETs induced in two different inverter chain circuits indicate an increase in the average SET pulsewidth as a function of the operating temperature. Unique SET test structures were also designed to differentiate between SETs induced in an nMOS transistor and those induced in a pMOS transistor. The SET widths induced in a pMOS transistor increase more with temperature than the SETs induced in an nMOS transistor. [ABSTRACT FROM PUBLISHER]

Details

Language :
English
ISSN :
15304388
Volume :
11
Issue :
1
Database :
Complementary Index
Journal :
IEEE Transactions on Device & Materials Reliability
Publication Type :
Academic Journal
Accession number :
59346489
Full Text :
https://doi.org/10.1109/TDMR.2010.2102354