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RF-Ionised Physical Vapour Deposition for Cu Thin Films: Deposition on Polymer Substrate.
- Source :
- Plasma Processes & Polymers; Jun2009 Supplement, Vol. 6, pS347-S351, 5p
- Publication Year :
- 2009
Details
- Language :
- English
- ISSN :
- 16128850
- Volume :
- 6
- Database :
- Complementary Index
- Journal :
- Plasma Processes & Polymers
- Publication Type :
- Academic Journal
- Accession number :
- 57541169
- Full Text :
- https://doi.org/10.1002/ppap.200930808