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Influence of Mg doping on structural defects in AlGaN layers grown by metalorganic chemical vapor deposition.
- Source :
- Applied Physics Letters; 12/3/2001, Vol. 79 Issue 23, p3788, 3p, 3 Diagrams, 1 Graph
- Publication Year :
- 2001
-
Abstract
- Influence of Mg doping on structural defects in Al[sub 0.13]Ga[sub 0.87]N layers grown on sapphire substrates by metalorganic chemical vapor deposition were studied using transmission electron microscopy. By increasing the Mg source flow rate, the reduction of dislocation density occurred up to the Mg source flow rate of 0.103 μmol/min. While the vertical type inversion domain boundaries (IDBs) were observed in the Al[sub 0.13]Ga[sub 0.87]N layers grown with the low Mg source flow rate, the IDBs in the Al[sub 0.13]Ga[sub 0.87]N layers grown with the high Mg source flow rate have horizontally multifaceted shapes. The change of polarity by the IDBs of horizontal type also resulted in the 180° rotation of pyramidal defects within the same AlGaN layer. © 2001 American Institute of Physics. [ABSTRACT FROM AUTHOR]
- Subjects :
- SEMICONDUCTOR doping
MAGNESIUM metallurgy
GALLIUM nitride
CHEMICAL vapor deposition
Subjects
Details
- Language :
- English
- ISSN :
- 00036951
- Volume :
- 79
- Issue :
- 23
- Database :
- Complementary Index
- Journal :
- Applied Physics Letters
- Publication Type :
- Academic Journal
- Accession number :
- 5562361
- Full Text :
- https://doi.org/10.1063/1.1424471