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Electron temperature measurement by a helium line intensity ratio method in helicon plasmas.
- Source :
- Physics of Plasmas; Dec2001, Vol. 8 Issue 12, p5303-5314, 12p, 1 Diagram, 2 Charts, 8 Graphs
- Publication Year :
- 2001
-
Abstract
- Electron temperature measurements in helicon plasmas are difficult. The presence of intense rf fields in the plasma complicates the interpretation of Langmuir probe measurements. Furthermore, the non-negligible ion temperature in the plasma considerably shortens the lifetime of conventional Langmuir probes. A spectroscopic technique based on the relative intensities of neutral helium lines is used to measure the electron temperature in the HELIX (Hot hELicon eXperiment) plasma [P. A. Keiter et al., Phys. Plasmas 4, 2741 (1997)]. This nonintrusive diagnostic is based on the fact that electron impact excitation rate coefficients for helium singlet and triplet states differ as a function of the electron temperature. The different aspects related to the validity of this technique to measure the electron temperature in rf generated plasmas are discussed in this paper. At low plasma density this diagnostic is believed to be very reliable since the population of the emitting level can be easily estimated with reasonable accuracy by assuming that all excitation originates from the ground state (steady-state corona model). At higher density, (n<subscript>e</subscript>≤10<superscript>11</superscript>1m<superscript>-3</superscript>secondary processes (excitation transfer, excitation from metastable, cascading) become more important and a more complex collisional radiative model must be used to predict the electron temperature. In this work, different helium transitions are examined and a suitable transition pair is identified. For an electron temperature of 10 eV, the line ratio is measured as a function of plasma density and compared to values predicted by models. The measured line ratio function is in good agreement with theory and the data suggest that the excitation transfer is the dominant secondary process in high-density plasmas. [ABSTRACT FROM AUTHOR]
- Subjects :
- PLASMA gases
ELECTRONS
TEMPERATURE
Subjects
Details
- Language :
- English
- ISSN :
- 1070664X
- Volume :
- 8
- Issue :
- 12
- Database :
- Complementary Index
- Journal :
- Physics of Plasmas
- Publication Type :
- Academic Journal
- Accession number :
- 5559119
- Full Text :
- https://doi.org/10.1063/1.1418020