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Inverse Hall-Petch relationship in the nanostructured TiO2: Skin-depth energy pinning versus surface preferential melting.

Authors :
Liu, X. J.
Yang, L. W.
Zhou, Z. F.
Chu, Paul K.
Sun, Chang Q.
Source :
Journal of Applied Physics; Oct2010, Vol. 108 Issue 7, p073503, 5p, 2 Graphs
Publication Year :
2010

Abstract

The functional dependence of stress, elastic modulus, melting point, and their interdependence on the identities (bond order, nature, length, and strength) of a representative bond of the specimen has been established for deeper insight into the transition from the conventional Hall-Petch relationship (HPR) to the inverse HPR (IHPR) for nanostructured TiO<subscript>2</subscript>. Theoretical reproduction of the observed inverse HPR suggests that the intrinsic competition between the energy-density gain (elastic modulus enhancement) and the cohesive-energy remnant (melting point depression) in the grain boundaries originates and the extrinsic competition between the activation and the inhibition of atomic dislocations activates the IHPR. [ABSTRACT FROM AUTHOR]

Details

Language :
English
ISSN :
00218979
Volume :
108
Issue :
7
Database :
Complementary Index
Journal :
Journal of Applied Physics
Publication Type :
Academic Journal
Accession number :
54470721
Full Text :
https://doi.org/10.1063/1.3471818