Modeling of precursor coverage in ion-beam induced etching and verification with experiments using XeF2 on SiO2.

MLA

Ebm, Christoph, et al. “Modeling of Precursor Coverage in Ion-Beam Induced Etching and Verification with Experiments Using XeF2 on SiO2.” Journal of Vacuum Science & Technology: Part B-Nanotechnology & Microelectronics, vol. 28, no. 5, Sept. 2010, pp. 946–51. EBSCOhost, https://doi.org/10.1116/1.3481139.

APA

Ebm, C., Hobler, G., Waid, S., & Wanzenboeck, H. D. (2010). Modeling of precursor coverage in ion-beam induced etching and verification with experiments using XeF2 on SiO2. Journal of Vacuum Science & Technology: Part B-Nanotechnology & Microelectronics, 28(5), 946–951. https://doi.org/10.1116/1.3481139

Chicago

Ebm, Christoph, Gerhard Hobler, Simon Waid, and Heinz D. Wanzenboeck. 2010. “Modeling of Precursor Coverage in Ion-Beam Induced Etching and Verification with Experiments Using XeF2 on SiO2.” Journal of Vacuum Science & Technology: Part B-Nanotechnology & Microelectronics 28 (5): 946–51. doi:10.1116/1.3481139.