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Spin-injection device prospects for half-metallic Fe3O4:Al0.1Ga0.9As interfaces.

Authors :
Mansell, R.
Laloë, J.-B.
Holmes, S. N.
Wong, P. K. J.
Xu, Y. B.
Farrer, I.
Jones, G. A. C.
Ritchie, D. A.
Barnes, C. H. W.
Source :
Journal of Applied Physics; Aug2010, Vol. 108 Issue 3, p034507, 4p, 1 Chart, 4 Graphs
Publication Year :
2010

Abstract

Electrical spin-injection across the Fe<subscript>3</subscript>O<subscript>4</subscript>:Al<subscript>0.1</subscript>Ga<subscript>0.9</subscript>As interface has been measured. We quantify this effect in an In<subscript>0.2</subscript>Ga<subscript>0.8</subscript>As:GaAs spin-light emitting diode optical device. The optical polarization signal is maintained from 4.2 up to 200 K without influence of the metal–insulator Verwey transition in the bulk of the Fe<subscript>3</subscript>O<subscript>4</subscript> film. An incomplete oxidation at the interface may be detrimental for this device, as it has a similar spin-injection efficiency to that of Fe:Al<subscript>0.1</subscript>Ga<subscript>0.9</subscript>As. Ambient temperature operation of this device may be possible although the present polarization levels remain too low for practical spintronic applications. We demonstrate the first step in the integration of molecular beam epitaxy-grown magnetic oxides into III–V semiconductor devices. [ABSTRACT FROM AUTHOR]

Details

Language :
English
ISSN :
00218979
Volume :
108
Issue :
3
Database :
Complementary Index
Journal :
Journal of Applied Physics
Publication Type :
Academic Journal
Accession number :
52929520
Full Text :
https://doi.org/10.1063/1.3462435