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Fabrication and field emission study of atomically sharp high-density tungsten nanotip arrays.
- Source :
- Journal of Applied Physics; Aug2010, Vol. 108 Issue 3, p036102, 3p, 2 Black and White Photographs, 1 Diagram, 1 Graph
- Publication Year :
- 2010
-
Abstract
- Atomically sharp high-density tungsten nanotip arrays are fabricated by nanocasting using a patterned SiO<subscript>2</subscript> template. The fabrication involves mainly top-down processes making it fully compatible with today’s Si technology. The obtained tungsten nanotip arrays show atomically sharp tips (radius of curvature smaller than 1 nm), high emitter density (∼5×10<superscript>10</superscript> cm<superscript>-2</superscript>), perfect tip alignment, and excellent field emission properties with a turn-on field of 2.1 V/μm and a field enhancement factor of 3334. The unique fabrication process flow leads to the highly uniform height of the W nanotips, allowing for submicron cathode-anode spacing, which very much relaxes the requirement of vacuum level and makes it possible for low vacuum operation. [ABSTRACT FROM AUTHOR]
- Subjects :
- TUNGSTEN
NANOPARTICLES
CATHODES
ELECTRODES
FIELD emission
Subjects
Details
- Language :
- English
- ISSN :
- 00218979
- Volume :
- 108
- Issue :
- 3
- Database :
- Complementary Index
- Journal :
- Journal of Applied Physics
- Publication Type :
- Academic Journal
- Accession number :
- 52929467
- Full Text :
- https://doi.org/10.1063/1.3437079