Improvement in the photon-induced bias stability of Al–Sn–Zn–In–O thin film transistors by adopting AlOx passivation layer.

This study examined the impact of the passivation layer on the light-enhanced bias instability of Al–Sn–Zn–In–O (AT–ZIO) thin film transistors. The suitably passivated device exhibited only a threshold voltage (V_th) shift of 0.72 V under light-illuminated negative-thermal stress conditions, whereas the device without a passivation layer suffered from a huge negative V_th shift of >11.5 V under identical conditions. The photocreated hole trapping model could not itself explain this behavior. Instead, the light-enhanced V_th instability of the unpassivated device would result mainly from the photodesorption of adsorbed oxygen ions after exposing the AT–ZIO back-surface in an ambient atmosphere. [ABSTRACT FROM AUTHOR]