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Influence of support on resistance to carbon-deposition of catalyst for CH4, CO2 with O2 to synthesis gas.

Authors :
Fu, Liyong
Xie, Weiguo
Lü, Shaojie
Qiu, Fali
Source :
Science in China. Series B: Chemistry; Apr2000, Vol. 43 Issue 2, p154-161, 8p
Publication Year :
2000

Abstract

In the reaction of catalytic oxidation of CH<subscript>4</subscript>, CO<subscript>2</subscript> with O<subscript>2</subscript> to synthesis gas, carbon-deposition is an important factor for deactivation. By adding different oxides to Ni/Al<subscript>2</subscript>O<subscript>3</subscript> catalyst, its resistance to carbon-deposition was improved. The experimental results indicate that the order of resistance to carbon-deposition is as follows: Ni/CaO-Al<subscript>2</subscript>O<subscript>3</subscript>>Ni/MgO-Al<subscript>2</subscript>O<subscript>3</subscript>>Ni/ TiO<subscript>2</subscript>-Al<subscript>2</subscript>O<subscript>3</subscript> > Ni/CeO<subscript>2</subscript>-Al<subscript>2</subscript>O<subscript>3</subscript>>Ni/La<subscript>2</subscript>O<subscript>3</subscript>-Al<subscript>2</subscript>O<subscript>3</subscript>>Ni/Y<subscript>2</subscript>O<subscript>3</subscript>-Al<subscript>2</subscript>O<subscript>3</subscript>>Ni/Fe<subscript>2</subscript>O<subscript>3</subscript>-Al<subscript>2</subscript>O<subscript>3</subscript>>Ni/Al<subscript>2</subscript>O<subscript>3</subscript>. The catalysts were characterized by CO<subscript>2</subscript>-TPD, O<subscript>2</subscript>-TPD and XPS methods. Here the relation between the order of resistance to carbon-deposition and performance of catalyst is discussed. [ABSTRACT FROM AUTHOR]

Details

Language :
English
ISSN :
10069291
Volume :
43
Issue :
2
Database :
Complementary Index
Journal :
Science in China. Series B: Chemistry
Publication Type :
Academic Journal
Accession number :
49373303
Full Text :
https://doi.org/10.1007/BF03027305