Estimating the out-of-band radiation flare levels for extreme ultraviolet lithography.

MLA

Simi A. George, et al. “Estimating the Out-of-Band Radiation Flare Levels for Extreme Ultraviolet Lithography.” Journal of Micro/Nanolithography, MEMS & MOEMS, vol. 8, no. 4, Oct. 2009, pp. 041502-041502-8. EBSCOhost, https://doi.org/10.1117/1.3238514.

APA

Simi A. George, Patrick P. Naulleau, Senajith Rekawa, Eric Gullikson, & Charles Drew Kemp. (2009). Estimating the out-of-band radiation flare levels for extreme ultraviolet lithography. Journal of Micro/Nanolithography, MEMS & MOEMS, 8(4), 041502-041502-8. https://doi.org/10.1117/1.3238514

Chicago

Simi A. George, Patrick P. Naulleau, Senajith Rekawa, Eric Gullikson, and Charles Drew Kemp. 2009. “Estimating the Out-of-Band Radiation Flare Levels for Extreme Ultraviolet Lithography.” Journal of Micro/Nanolithography, MEMS & MOEMS 8 (4): 041502-041502-8. doi:10.1117/1.3238514.