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Special Section on the International Symposium on Semiconductor Manufacturing.

Authors :
OTSUKA, NOBUHIRO
UCHINO, TOSHIYUKI
Source :
IEEE Transactions on Semiconductor Manufacturing; Nov2009, Vol. 22 Issue 4, p417-418, 2p, 2 Black and White Photographs
Publication Year :
2009

Abstract

Information about the 17th International Symposium on Semiconductor Manufacturing held in Tokyo, Japan from October 27 to 29, 2008 is presented. Highlights include the discussion on the yield enhancement and clean technology, which has been considered an essential technical area of semiconductor manufacturing. Further, it was also said to have given emphasis on the new dry and wet combined equipment having the capacity of addressing the issues on process performance and cost-control.

Details

Language :
English
ISSN :
08946507
Volume :
22
Issue :
4
Database :
Complementary Index
Journal :
IEEE Transactions on Semiconductor Manufacturing
Publication Type :
Academic Journal
Accession number :
45591992
Full Text :
https://doi.org/10.1109/TSM.2009.2031745