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Mechanisms of nonstoichiometry in HfN1-x.

Authors :
Ashley, N. J.
Parfitt, D.
Chroneos, A.
Grimes, R. W.
Source :
Journal of Applied Physics; Oct2009, Vol. 106 Issue 8, p083502-1-083502-4, 4p, 1 Diagram, 3 Graphs
Publication Year :
2009

Abstract

Density functional theory is used to calculate defect structures that can accommodate nonstoichiometry in hafnium nitride: HfN<subscript>1-x</subscript>, 0≤×≤0.25. It is predicted that a mechanism assuming simple distributions of nitrogen vacancies can accurately describe the variation in the experimentally observed lattice parameter with respect to the nitrogen nonstoichiometry. Although the lattice parameter changes are remarkably small across the whole nonstoichiometry range, the variations in the bulk modulus are much greater. [ABSTRACT FROM AUTHOR]

Details

Language :
English
ISSN :
00218979
Volume :
106
Issue :
8
Database :
Complementary Index
Journal :
Journal of Applied Physics
Publication Type :
Academic Journal
Accession number :
44909738
Full Text :
https://doi.org/10.1063/1.3236669