Photocatalysis of Ag Doped TiO x Films Prepared at Room Temperature.

The aim of this paper is an investigation of the photocatalytic efficiency of TiO _x thin films deposited by DC reactive magnetron sputtering at low temperature and doped by Ag noble metal. Crystallographic structure and chemical composition of as-deposited films were examined by XRD and RBS, respectively. Ag/TiO _x films morphology was studied by SEM analysis. The photocatalytic activity was evaluated from the decomposition speed of an aqueous solution of the Acid Orange 7, exposed to UV/VIS light. A systematic change of Ag concentration in TiO _x films led to a maximum activity. Such a maximum is discussed taking into account composition, morphology and structure of the films. [ABSTRACT FROM AUTHOR]