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OH kinetic in high-pressure plasmas of atmospheric gases containing C2H6 studied by absolute measurement of the radical density in a pulsed homogeneous discharge.
- Source :
- Journal of Physics D: Applied Physics; Aug2009, Vol. 42 Issue 16, p165203-165203, 1p
- Publication Year :
- 2009
-
Abstract
- The absolute value of the hydroxyl radical was measured in the afterglow of an homogeneous photo-triggered discharge generated in N2/O2/H2O/C2H6 mixtures, using a UV absorption diagnostic synchronized with the discharge current pulse. Measurements show that OH is efficiently produced even in the absence of water vapour in the mixture, and that the radical production is closely linked to the degradation kinetic of the hydrocarbon. Experimental results for dry mixtures, both for OH and for the removal of ethane in the discharge volume, are compared with predictions of a self-consistent 0D discharge and the kinetic model. It appears that the oxidation reaction of the ethane molecule by O(3P) atoms plays a minor role. Dissociation of the hydrocarbon through quenching collisions of the nitrogen metastable states are of great importance for a low oxygen concentration value. Also, the oxidation of ethane by O(1D) cannot be neglected at high oxygen concentration. The most probable exit channel for N2 states quenching collisions by ethane is the production of ethene and hydrogen molecules. Afterwards C2H4 should be dissociated to produce H and H2. As previously suggested from the study of the OH density time evolution in relative value, the recombination of H and O atoms appears as a main process for the production of OH in transient low temperature plasmas generated in atmospheric gases at high pressure. Another important reaction is the reduction of the HO2 radical by O, this radical coming from the addition of H on the oxygen molecule. H atoms come from numerous kinetic processes, amongst which is the dissociation of ethene. [ABSTRACT FROM AUTHOR]
Details
- Language :
- English
- ISSN :
- 00223727
- Volume :
- 42
- Issue :
- 16
- Database :
- Complementary Index
- Journal :
- Journal of Physics D: Applied Physics
- Publication Type :
- Academic Journal
- Accession number :
- 43794145
- Full Text :
- https://doi.org/10.1088/0022-3727/42/16/165203