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Low- Temperature Atmospheric-Pressure-Plasma Jet for Thin-Film Deposition.
- Source :
- IEEE Transactions on Plasma Science; Jul2009 Part 1 of 2, Vol. 37 Issue 7, p1127-1128, 8p
- Publication Year :
- 2009
-
Abstract
- A novel plasma system based on double-pipe method was generated for the development of an atmospheric-pressure- plasma jet (APPJ). This APPJ deposits homogeneous thin films without unfavorable contamination in plasma source. The experimentally measured gas-phase temperature of the argon APPJ maintained at RF electric power was around 40 °C-80 °C, indicating this APPJ to be a low-temperature plasma. This plasma system will provide a chamberless deposition for coating application. [ABSTRACT FROM AUTHOR]
Details
- Language :
- English
- ISSN :
- 00933813
- Volume :
- 37
- Issue :
- 7
- Database :
- Complementary Index
- Journal :
- IEEE Transactions on Plasma Science
- Publication Type :
- Academic Journal
- Accession number :
- 43630677
- Full Text :
- https://doi.org/10.1109/TPS.2008.2011636