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Low-leakage-current metal-insulator-semiconductor-insulator-metal photodetector on silicon...

Authors :
Seto, M.
Rochefort, C.
de Jager, S.
Hendriks, R.F.M.
Hooft, G.W.'t
van der Mark, M.B.
Source :
Applied Physics Letters; 9/27/1999, Vol. 75 Issue 13, p1976, 3p, 1 Black and White Photograph, 1 Diagram, 2 Graphs
Publication Year :
1999

Abstract

Shows that the leakage current through a metal-semiconductor-metal-photodetector can be reduced by placing a thin interfacial silicon dioxide layer between the Schottky metal and the silicon substrate. Factor reduction in leakage-current density.

Details

Language :
English
ISSN :
00036951
Volume :
75
Issue :
13
Database :
Complementary Index
Journal :
Applied Physics Letters
Publication Type :
Academic Journal
Accession number :
4298880
Full Text :
https://doi.org/10.1063/1.124890