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Si resonant interband tunnel diodes grown by low-temperature molecular-beam epitaxy.

Authors :
Thompson, Phillip E.
Hobart, Karl D.
Twigg, Mark E.
Jernigan, Glenn G.
Dillon, Thomas E.
Rommel, Sean L.
Berger, Paul R.
Simons, David S.
Chi, Peter H.
Lake, Roger
Seabaugh, Alan C.
Source :
Applied Physics Letters; 8/30/1999, Vol. 75 Issue 9, p1308, 3p, 1 Diagram, 3 Graphs
Publication Year :
1999

Abstract

Presents silicon resonant interband tunnel diodes that demonstrate negative differential resistance at room temperature with peak-to-valley current ratios greater than 2. Use of low-temperature molecular-beam epitaxy to grow the structures; Atomic distribution profiles of the as-grown and annealed structures.

Details

Language :
English
ISSN :
00036951
Volume :
75
Issue :
9
Database :
Complementary Index
Journal :
Applied Physics Letters
Publication Type :
Academic Journal
Accession number :
4283641
Full Text :
https://doi.org/10.1063/1.124677